Diffusion coefficient = lnD ;
R= Constant
T take as inverse temperature
a)
Diffusion time
Ion
dose by Gaussian distribution
a)
The dopants can be introduced in the
specified regions of silicon substrate and the diffusion takes place for the
high temperature process. The penetration of the silicon is measured and at
higher temperature the dopant atoms can alter the penetration depth of the
wafer surface
Question No: 3
Required vacuum
a) New pressure if aluminum evaporated
Question No: 4
Question No: 5
a)
For reverse bias
Question No: 6
The static dielectric constant of water
is 78 at room temperature. it decreases to 20 at f = 40 GHz. If the optical
high frequency dielectric constant is 5 what is the relaxation time of water
T The classical theory of Debye for the
single mechanism is and the Debye equation becomes
Attenuation constant
Question No: 7
A 8 mm inner diameter copper coax cable
is carrying a voltage of 50 k V. The dielectric has a thermal conductivity of
0.2 M/m K and is 5 mm thick. It has a dielectric strength that varies linearly
from 60 M V/m at -50 C to 10 M V/m at 150 C. at what DC current will the cable
fail if the outside shield temperature is 300 K
The magnetic susceptibility of the
material is higher therefore the material contents provides higher magnetic
contribution. The isolated properties are related to the measured influence for
the magnetic phases in the material.
A.
Energy absorbed per cycle
The cycle is revised from initial point
to the final point therefore the work done in the cycle becomes zero. The
estimated energy absorbed in the cycle becomes smaller as energy is work done
per unit area.
B.
Temperature of inductor