Discussion on the Silicon Implants

The video is all about the silicon implants. I have watched this video and at the starting of this video, it was shown that the silicon is very useful element in the world that has many applications in the world. It is being used to manufacture several types of chips used in the computing devices. There are so many electronic products exist in the world that have been used by humans in their daily lives such computer, cameras, televisions, cell phones, laptop computers, medical electric equipment. The silicon chips which are used in the different types of the electronic devices which are very powerful to perform different operations as well as can also handle heavy computational programs. They are almost used in every field of life even used in manufacturing the computerized rockets and the spaceships. If we see inside these silicon chips, several combinations of the slicon blocks will be shown that have millions of the transistors to pass the current through and these are connected by multi electronic pathways. For the layering of these transistors require many materials. These transistors can be made by four major processes which are: deposition, photolithography, etch as well as ion implantation. In the Ion implantation, the designs are changed into the electrical properties. It is explained that one silicon atom has four outer shell electrons. At the room temperature, when it is heated the energy and made the silicon bonds with other atoms by releasing one extra heated electron. Theses electrons will have the negative carriers. By seeing on the bond of the silicon atoms, every atom is connected to the each other which have the positive carriers and the free electrons are freely move in this bonding structure. It is also described that the pure silicon or stiff structure of the silicon is highly resistant. The precise control of the number and location allows the engineers to redesign the silicon electrical properties. Due to this feature, the scientists can perform several tests and methods on the silicon. It is also explain about the silicon wiring in which two gates exists which are: P-channel and N-Channel transistors. Normally the N-channel has two components which known as the source and the drain and the electrons in them are type regions. When the small electric voltage will be applied to the gate, it repels the electrons form the P-gate but it connect the negative electrons of P-channel and N channels. When they are connected to each other, the negative charges started to the run in the anti clock wise. This movement in the P-channel is downward while the movement in the N-channel is upward. So, by performing different types of the methods such as electrify and heating the silicon, the processes of ion implantation on the silicon chips will be completed and they are now ready to use into the computing chips to manufacture electronic devices.